Technical Event
Tuesday Plenary
25 February 2025 • 8:20 AM - 10:00 AM PST | Conv. Ctr., Grand Ballroom 220A
Session Chairs: Qinghuang Lin, Canon Nanotechnologies, Inc.(United States) and John Robinson, KLA (United States)
8:20 AM - 8:40 AM:
Presentation of New SPIE Fellows
8:40 AM - 9:20 AM:
Scaling EUV and holistic lithography to support Moore’s Law through the AI era
Strong trends drive the semiconductor industry: ubiquitous computing, the energy transformation and artificial intelligence, to name just a few, have the potential to propel the industry towards $1 trillion of sales by 2030. Enabling this trajectory is the extension of Moore’s Law through innovation in semiconductor devices, materials, manufacturing technologies and 3D integration.
To enable chip makers in their pursuit of more powerful, smaller, cheaper, more integrated and more energy-efficient chips, ASML focuses on driving a holistic lithography roadmap with innovation across the entire product and service portfolio. At the core of it is EUV lithography technology. EUV is now mature, and the roadmap offers further improvements in imaging performance, accuracy and productivity, as well as a major reduction in cost per wafer. EUV technology must however be complemented with a large suite of lithography, metrology and process control applications to optimize cost and performance.
In 2024, ASML has shipped several High NA EUV systems and is enabling customers to prepare High NA insertion by supporting its customers’ R&D with those systems, as well as in its High NA lab in Veldhoven, the Netherlands. The new High NA optics, combined with progress on the EUV source, provide the foundation for the future of EUV in the form of a common platform, capable of carrying 0.33 NA, 0.55 NA and 0.75 NA and providing a significant cost reduction opportunity. Our progress on multi-beam, wafer bonding process control and DUV lithography for advanced packaging are the other critical elements ASML is providing in support of Moore’s Law.
ASML is committed to push technology to new limits, partnering with all members of our ecosystem, to enable chip makers to realize their ambitions.
Christophe Fouquet is President & CEO of ASML. A French national, he joined ASML in 2008. He was appointed to the Board of Management in 2018 as Chief Business Officer and appointed President & Chief Executive Officer in 2024.
Christophe holds a Masters’ degree in physics from the Institut Polytechnique de Grenoble and has more than 25 years’ experience in the semiconductor industry.
He is a firm believer in putting the customer at the center of everything that ASML does, and in empowering its global team of more than 42,000 people to take ownership and to always ask: What’s next?
9:20 AM - 10:00 AM:
Abstract to be announced
Heike Riel is IBM Fellow, Head of Science of Quantum and Information Technology and Lead of IBM Research Quantum Europe at IBM Research. She is responsible for leading the research agenda of the Science of Quantum and Information Technology department aiming to create scientific and technological breakthroughs in Quantum Computing, Physics of Artificial Intelligence, Nanoscience and Nanotechnology, Precision Diagnostics and Smart System Integration.
She is a distinguished expert in nanotechnology and nanosciences and focuses her research on advancing the frontiers of information technology through the physical sciences. She contributed to advancements in the science and technology of nanoscale electronics, in particular the exploration and development of semiconducting nanowires and nanostructures for applications in future electronic and optoelectronic devices, in molecular electronics for future nanoscale switches and memory applications, and organic light-emitting diodes for display applications. Her current research interests include new materials and device concepts for future nanoelectronics for applications in quantum computing and neuromorphic computing. She also serves as the Deputy Director of the new Swiss National Competence Center for Research on Silicon Spin Qubits.
Event Details FORMAT: General session with live audience Q&A to follow each presentation.
MENU: Coffee, decaf, and tea will be available outside presentation room.
SETUP: Theater style seating.
8:20 AM - 8:40 AM:
Presentation of New SPIE Fellows
8:40 AM - 9:20 AM:
Scaling EUV and holistic lithography to support Moore’s Law through the AI era
 |
Christophe Fouquet
ASML Netherlands B.V. (Netherlands) |
Strong trends drive the semiconductor industry: ubiquitous computing, the energy transformation and artificial intelligence, to name just a few, have the potential to propel the industry towards $1 trillion of sales by 2030. Enabling this trajectory is the extension of Moore’s Law through innovation in semiconductor devices, materials, manufacturing technologies and 3D integration.
To enable chip makers in their pursuit of more powerful, smaller, cheaper, more integrated and more energy-efficient chips, ASML focuses on driving a holistic lithography roadmap with innovation across the entire product and service portfolio. At the core of it is EUV lithography technology. EUV is now mature, and the roadmap offers further improvements in imaging performance, accuracy and productivity, as well as a major reduction in cost per wafer. EUV technology must however be complemented with a large suite of lithography, metrology and process control applications to optimize cost and performance.
In 2024, ASML has shipped several High NA EUV systems and is enabling customers to prepare High NA insertion by supporting its customers’ R&D with those systems, as well as in its High NA lab in Veldhoven, the Netherlands. The new High NA optics, combined with progress on the EUV source, provide the foundation for the future of EUV in the form of a common platform, capable of carrying 0.33 NA, 0.55 NA and 0.75 NA and providing a significant cost reduction opportunity. Our progress on multi-beam, wafer bonding process control and DUV lithography for advanced packaging are the other critical elements ASML is providing in support of Moore’s Law.
ASML is committed to push technology to new limits, partnering with all members of our ecosystem, to enable chip makers to realize their ambitions.
Christophe Fouquet is President & CEO of ASML. A French national, he joined ASML in 2008. He was appointed to the Board of Management in 2018 as Chief Business Officer and appointed President & Chief Executive Officer in 2024.
Christophe holds a Masters’ degree in physics from the Institut Polytechnique de Grenoble and has more than 25 years’ experience in the semiconductor industry.
He is a firm believer in putting the customer at the center of everything that ASML does, and in empowering its global team of more than 42,000 people to take ownership and to always ask: What’s next?
9:20 AM - 10:00 AM:
 |
Heike Riel
IBM Research Frontiers Institute (Switzerland) |
Abstract to be announced
Heike Riel is IBM Fellow, Head of Science of Quantum and Information Technology and Lead of IBM Research Quantum Europe at IBM Research. She is responsible for leading the research agenda of the Science of Quantum and Information Technology department aiming to create scientific and technological breakthroughs in Quantum Computing, Physics of Artificial Intelligence, Nanoscience and Nanotechnology, Precision Diagnostics and Smart System Integration.
She is a distinguished expert in nanotechnology and nanosciences and focuses her research on advancing the frontiers of information technology through the physical sciences. She contributed to advancements in the science and technology of nanoscale electronics, in particular the exploration and development of semiconducting nanowires and nanostructures for applications in future electronic and optoelectronic devices, in molecular electronics for future nanoscale switches and memory applications, and organic light-emitting diodes for display applications. Her current research interests include new materials and device concepts for future nanoelectronics for applications in quantum computing and neuromorphic computing. She also serves as the Deputy Director of the new Swiss National Competence Center for Research on Silicon Spin Qubits.
Event Details FORMAT: General session with live audience Q&A to follow each presentation.
MENU: Coffee, decaf, and tea will be available outside presentation room.
SETUP: Theater style seating.