Program now available!
Register now
>
23 - 27 February 2025
San Jose, California, US

Information for Authors and Presenters

Instructions, important dates, and other information for a successful conference experience

Plan to attend

Find important information for author presenters.

All conferences are accepting post-deadline submissions until 6 January 2025. New submissions are considered as space becomes available. View the conference you want to participate in to find out if it is accepting post-deadline submissions.

Presenter at SPIE Advanced Lithography

Important dates

Abstracts due 11 September 2024
Registration opens November 2024
Author notified and program posts online 18 November 2024
Student Grant applications due 21 November 2024
Submission system opens for manuscripts and poster PDFs* 23 December 2024
Post-deadline abstract submission due 6 January 2025
Poster PDFs due for spie.org preview and publication 29 January 2025
All manuscripts due 12 February 2025
Advance upload deadline for oral presentation slides** 21 February 2025

*Contact author or speaker must register prior to uploading
**After this date slides must be uploaded onsite at Speaker Check-In

Why should you present and publish your work as part of Advanced Lithography + Patterning?

Submitting an abstract puts a spotlight on your work:

  • Your participation in the conference gains you international visibility
  • Your research becomes part of the world's permanent scientific record
  • Your work will be indexed in all relevant scientific databases*

Make sure that your research gets timely publication in the SPIE Digital Library.

*SPIE partners with relevant scientific databases to ensure visibility for your research, including Astrophysical Data System (ADS), Ei Compendex, CrossRef, Google Scholar, Inspec, Scopus, and Web of Science Conference Proceedings Citation Index.

Preparing for your participation