Topics range from optical and EUV lithography, patterning technologies, metrology, and process integration for semiconductor manufacturing and adjacent applications. Come hear the latest research at Advanced Lithography + Patterning. We are excited to offer another outstanding program.
Late abstract submissions will be considered until 6 January, 2025. See each conference for more information.
Application tracks list presentations on a topical area with broad-range interest so that participants can easily locate presentations in their areas of interest. In the 2025 program, these topics include AI / ML, sustainability, stochastics, advanced packaging, and EPE/overlay.
Canon Nanotechnologies, Inc. (United States)
Symposium Chair
KLA Corporation (United States)
Symposium Co-chair
Share your research at SPIE Advanced Lithography + Patterning. This invitation from the Symposium Chairs outlines all the reasons and benefits of being involved in this leading event.
Presentations and manuscripts presented at Advanced Lithography + Patterning are published in the Conference Proceedings on the SPIE Digital Library.
