SPIE Advanced Lithography + Patterning Awards

Jump to the list of winners from the previous conferences

Optical and EUV Nanolithography (AL101)

ASML Best Student Paper Award

Students submitting papers to Optical and EUV Nanolithography will be considered for the ASML Best Student Paper. This award is given each year at this conference and recognizes extraordinary work achieved by students interested in the photolithography field, and strongly supports the contributions made to scientific advancement at the conference. The award includes a plaque along with a monetary award to help the student's future research activities.

Award sponsored by:

Metrology, Inspection, and Process Control (AL103)

Diana Nyyssonen Memorial Award for Best Paper

The Diana Nyyssonen Memorial Best Paper Award for the best paper of the Conference on Metrology, Inspection, and Process Control recognizes the most significant current contribution to the field, based on the technical merit and persuasiveness of the oral presentation, as well as on the overall quality of the manuscript published in the conference proceedings. Presented at the subsequent year’s conference, the Diana Nyyssonen Memorial Best Paper Award consists of an SPIE citation and an honorarium.

Award sponsored by:

Karel Urbánek Best Student Paper Award

The Karel Urbánek Best Student Paper Award recognizes the most promising contribution to the field by a student, based on the technical merit and persuasiveness of the paper presented at the current year’s conference. Awarded near the end of the week, the Karel Urbánek Best Student Paper Award consists of an SPIE citation and an honorarium.

To be eligible, the leading author and presenter of the paper must be a student. To establish eligibility, the bio submitted with the abstract must state the student’s academic status and institution, as well as their advisor’s name and contact information.

Award sponsored by:

Vladimir Ukraintsev Award for Collaboration in Metrology

The Vladimir Ukraintsev Award for Collaborations in Metrology recognizes the most significant publication on inter-disciplinary explorations of metrology accuracy, round-robin studies, dissemination of best-known methods, and other industry collaborations. The recipient will be determined by the Metrology, Inspection, and Process Control program committee on occasion, as warranted, based on the publication’s potential to influence the industry via an oral or poster presentation, as well as on the overall quality of the manuscript published in the conference proceedings. The Vladimir Ukraintsev Award for Collaborations in Metrology, when awarded, will be presented at the subsequent year’s conference, and consists of an SPIE citation and an honorarium.

Novel Patterning Technologies (AL104)

Novel Patterning Technologies Student Award 2025

Recognizing the invaluable contributions made by students to our patterning community, the conference proudly presents a "Best Student Paper Award," generously sponsored by Meta. Eligible candidates must be enrolled as students in a relevant STEM field at the time of presentation and submit a proceedings manuscript (2-page minimum) by February 5, 2025. Student presentations will be evaluated on the basis of their technical merit, novelty, presentation quality and communication skills. The award will include a certificate and a monetary gift.

Award sponsored by:

Advances in Patterning Materials and Processes (AL105)

C. Grant Willson Best Paper Award in Patterning Materials and Processes

The C. Grant Willson Best Paper Award in Patterning Materials and Processes recognizes the best oral paper presented at the previous year. Candidate papers are nominated and selected by the SPIE Patterning Materials conference committee. Judging criteria include the technical originality, completeness, relevance, quality of oral presentation, and quality of proceedings manuscript. Invited keynote talks are not eligible. The award consists of a certificate and a cash honorarium of $1,000 USD.

Award sponsored by:

Jeffrey Byers Best Poster Award in Patterning Materials and Processes

The Jeffrey Byers Best Poster Award in Patterning Materials and Processes recognizes the best poster presented at the previous year. Candidate posters are nominated and selected by the SPIE Patterning Materials conference committee. Judging criteria include the technical originality, completeness, relevance, quality of poster presentation, and quality of proceedings manuscript. The award consists of a certificate and a cash honorarium of $1000 USD.

Award sponsored by:

Hiroshi Ito Student Award in Patterning Materials and Processes

The Hiroshi Ito Student Award in Patterning Materials and Processes recognizes the best student paper presented at the previous year. Candidate papers are nominated and selected by the SPIE Patterning Materials conference committee. To be eligible, the primary and presenting author must be a student or post-doc at the time of the conference. Judging criteria include the technical originality, completeness, relevance, quality of presentation, and quality of proceedings manuscript. Both oral and poster submissions are eligible; however, the award will not be given to a submission that is a concurrent winner of the Willson or Byers Awards. The award consists of a certificate and a cash honorarium of $1,000 USD.

Award sponsored by:

Advanced Etch Technology and Process Integration for Nanopatterning (AL106)

The Advanced Etch Technology and Process Integration Best Student Paper Award

Continuing from last year, the Advanced Etch Technology and Process Integration conference will offer a “Best Student Paper Award” sponsored by Meta. All student paper submissions automatically qualify for consideration by the committee. The award will recognize the paper with the most significant contribution and innovation for solving advanced patterning challenges and the quality of the oral presentation/poster presentation. After the paper presentation, the committee will vote for the best paper, and the award winner is notified by the conference chairs and SPIE. The award will include a certificate and monetary gift.

Award sponsored by:

Thank you to the committee and chairs for selecting these winners and recognizing the brilliance of each researcher's work. See below for the awards that were granted at the 2023 event.