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25 - 30 January 2025
San Francisco, California, US
Conference 13369 > Paper 13369-40
Paper 13369-40

Silicon-integrated optical modulators: surpassing the limitations of plasma-dispersion effect (Invited Paper)

29 January 2025 • 10:40 AM - 11:10 AM PST | Moscone South, Room 307 (Level 3)

Abstract

Silicon (Si) photonics stands as a solid candidate to address the scaling challenges of emerging communication systems with an ever-growing number of interconnected devices. However, Si has major physical limitations that prevent on-chip integration of key functions including strong two-photon absorption limiting nonlinear optical phenomenon, an indirect bandgap nature hindering light emission and amplification and more specifically Si is a centrosymmetry semiconductor preventing ultra-fast and low power consumption optical modulation based on Pockels effect. The latter limitation strongly limits the evolution of the photonic integrated circuits (PIC). In this paper, an overview of the different approaches for light modulation in silicon will be presented including the plasma-dispersion effect, currently used in PIC and the Pockels based modulators integrated in Si circuits.

Presenter

Ctr. de Nanosciences et de Nanotechnologies, Univ. Paris-Saclay, CNRS (France)
Application tracks: Photonic Chips
Author
Ctr. de Nanosciences et de Nanotechnologies, Univ. Paris-Saclay, CNRS (France), Univ. Grenoble Alpes (France)
Author
Ctr. de Nanosciences et de Nanotechnologies, Univ. Paris-Saclay, CNRS (France), Univ. Grenoble Alpes, CEA-LETI, MINATEC (France)
Author
Ali El Boutaybi
Ctr. de Nanosciences et de Nanotechnologies, Univ. Paris-Saclay, CNRS (France)
Author
Ctr. de Nanosciences et de Nanotechnologies, Univ. Paris-Saclay, CNRS (France)
Author
Ctr. de Nanosciences et de Nanotechnologies, Univ. Paris-Saclay, CNRS (France)
Author
Samson Edmond
Ctr. de Nanosciences et de Nanotechnologies, Univ. Paris-Saclay, CNRS (France)
Author
Ali Belarouci
Institut des Nanotechnologies de Lyon, Univ. de Lyon, CNRS (France), Institut National des Sciences Appliquées de Lyon (France)
Author
Ctr. de Nanosciences et de Nanotechnologies, Univ. Paris-Saclay, CNRS (France)
Author
Ctr. de Nanosciences et de Nanotechnologies, Univ. Paris-Saclay, CNRS (France)
Author
Ctr. de Nanosciences et de Nanotechnologies, Univ. Paris-Saclay, CNRS (France)
Author
FEMTO-ST, Univ. de Franche-Comté, CNRS (France)
Author
Optoelectronics Research Ctr., Univ. of Southampton (United Kingdom)
Author
Guy Aubin
Ctr. de Nanosciences et de Nanotechnologies, Univ. Paris-Saclay, CNRS (France)
Author
Ctr. de Nanosciences et de Nanotechnologies, Univ. Paris-Saclay, CNRS (France)
Author
Ctr. de Nanosciences et de Nanotechnologies, Univ. Paris-Saclay, CNRS (France)
Author
Ctr. de Nanosciences et de Nanotechnologies, Univ. Paris-Saclay, CNRS (France)
Author
Institut National des Sciences Appliquées de Lyon (France), Institut des Nanotechnologies de Lyon, Univ. de Lyon (France)
Author
Optoelectronics Research Ctr. (United Kingdom)
Author
Optoelectronics Research Ctr. (United Kingdom)
Author
Optoelectronics Research Ctr. (United Kingdom)
Author
Univ. Grenoble Alpes, CEA-LETI, MINATEC (France)
Author
Univ. Grenoble Alpes, CEA-LETI, MINATEC (France)
Author
Yohan Desieres
Univ. Grenoble Alpes, CEA-LETI, MINATEC (France)
Author
Carlos Alonso-Ramos
Ctr. de Nanosciences et de Nanotechnologies, Univ. Paris-Saclay, CNRS (France)
Presenter/Author
Ctr. de Nanosciences et de Nanotechnologies, Univ. Paris-Saclay, CNRS (France)