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25 - 30 January 2025
San Francisco, California, US
Conference 13344 > Paper 13344-23
Paper 13344-23

Faraday rotator design for 266nm, 343nm and 355nm lasers

28 January 2025 • 11:50 AM - 12:10 PM PST | Moscone South, Room 206 (Level 2)

Abstract

The continuous lasing process of a laser is sensitive to back reflected laser light, because it is disturbing the intrinsic stimulated emission process in the laser material. Faraday Isolators and Rotators are therefore commonly used to separate back reflected light from entering the laser cavity or the resonator. We present a new design of a Faraday Rotator for UV lasers with laser wavelengths of 343 and 355nm. This Faraday Rotator is suited for CW or pulsed UV lasers with typically averaged laser power up to few 10W range. In addition, we demonstrate the design option and feasibility of a 266nm Faraday Isolator.

Presenter

Volker Melzer
Qioptiq Photonics GmbH & Co. KG (Germany), Excelitas Technologies Corp. (United States)
During his Ph.D. thesis Volker investigated the structure and interaction of 2-dimensional surfactant monolayers at the air-water interface. He joined AGFA Corporation in 1998 where he worked as project manager on the development of scanning systems used for X-ray phosphor plate scanners. In 2007 he joined Qioptiq as project manager for UV and IR imaging lenses. Since 2014 he is in charge as product manager for laser and fiber products provided by Excelitas.
Presenter/Author
Volker Melzer
Qioptiq Photonics GmbH & Co. KG (Germany), Excelitas Technologies Corp. (United States)
Author
Qioptiq Photonics GmbH & Co. KG (Germany)
Author
Qioptiq Photonics GmbH & Co. KG (Germany)