4:00 PM - 5:30 PM
Panel discussion: Early high-NA EUV learning and the implications for the future of EUV lithography

Moderator:
Harry Levinson, HJL Lithography (United States)

Panelists:
Mark Phillips, Intel Corp. (United States)
Chris Mack, Fractilia (United States)
Tom Cecil, Synopsys (United States)
Vicky Philipsen, imec (Belgium)
Jason Stowers, Inpria Corp. (United States)
Seongbo Shim, SAMSUNG Electronics Co., Ltd. (Republic of Korea)

High-NA EUV lithography brings the potential for continued lithographic scaling. These advances come with complications, including anamorphic patterning, stitching, and new mask materials. Early learning about many high-NA topics is arriving with the first tools under testing. How does the information learned in early high-NA development compare to predictions? What does early high-NA learning teach about developing hyper-NA lithography?

Awards 5:30-5:45 PM
Please join us for the presentation of the 2024 BACUS awards and scholarship.