Thank you for your interest in participating in SPIE Photomask Technology + EUV Lithography. We recommend reviewing the information below to become familiar with how to prepare your presentation.
| Abstracts due | 15 May 2024 |
| Registration opens | July 2024 |
| Authors notified and program posts online | 8 July 2024 |
| Student grant applications due | 15 July 2024 |
| Submission system opens for manuscripts and poster PDFs* | 29 July 2024 |
| Post-deadline abstracts due | 12 August 2024 |
| Poster PDFs due for spie.org preview and publication | 4 September 2024 |
| Manuscripts due | 11 September 2024 |
*Contact author or speaker must register prior to uploading
