Jan B.P. van Schoot, PhD, is Director of System Engineering and Technical Expert at ASML, based in Veldhoven, The Netherlands.
Van Schoot studied Electrical Engineering at Twente University of Technology. He received his PhD in Physics on the subject of non-linear optical waveguide devices in 1994 and held a post-doc position studying waveguide based electro-optical modulators. He joined ASML in 1996 and was Project Leader for the Application of the first 5500/500 scanner and its successors up to 5500/750. In 2001 he became Product Development Manager of Imaging Products (DoseMapper, Customized Illumination). In 2007 he joined the dept of System Engineering. He was responsible for the Optical Columns of the 0.25NA and 0.33NA EUV systems. After this he worked on the design of the EUV source. He was the study leader of the High-NA EUV system and is now responsible for the High-NA optical train. He holds over 40 patents and presents frequently at conferences about photo lithography.
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