Paper 13351-50
LIPSS generation improvement with a 0.07 uniformity square top-hat at 400µJ 1030nm based on multi-plane light conversion
30 January 2025 • 9:20 AM - 9:40 AM PST | Moscone South, Room 214 (Level 2)
Abstract
Increasing the available energy and power of femtosecond laser has always open new applications to micro-processing. In this article we focus on the use of beam-shaping with high energy input of industrial lasers. Indeed, with the increase of the energy multiple difficulties appear for an industrial robust use.
For the first time a passive beam stabilization based on Multi Plane Light Conversion technology has been implemented at 400µJ in IR. Passive stabilization is key to get more robust process implementation as it enables a stable beam-shaping in all circumstances once the system is installed and without re-alignement. This stabilization is associated with high quality square top-hat beam-shaping with a high sharpness (transition zones of 15µm for a 60µm top-hat in the processing plane) and a 0.07 beam uniformity.
Process improvements compared to process without beam-shaping will be discussed, with a focus on LIPSS generation improvement.
Presenter
Adeline Orieux
CAILabs (France)