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25 - 30 January 2025
San Francisco, California, US
Conference 13351 > Paper 13351-50
Paper 13351-50

LIPSS generation improvement with a 0.07 uniformity square top-hat at 400µJ 1030nm based on multi-plane light conversion

30 January 2025 • 9:20 AM - 9:40 AM PST | Moscone South, Room 214 (Level 2)

Abstract

Increasing the available energy and power of femtosecond laser has always open new applications to micro-processing. In this article we focus on the use of beam-shaping with high energy input of industrial lasers. Indeed, with the increase of the energy multiple difficulties appear for an industrial robust use. For the first time a passive beam stabilization based on Multi Plane Light Conversion technology has been implemented at 400µJ in IR. Passive stabilization is key to get more robust process implementation as it enables a stable beam-shaping in all circumstances once the system is installed and without re-alignement. This stabilization is associated with high quality square top-hat beam-shaping with a high sharpness (transition zones of 15µm for a 60µm top-hat in the processing plane) and a 0.07 beam uniformity. Process improvements compared to process without beam-shaping will be discussed, with a focus on LIPSS generation improvement.

Presenter

Adeline Orieux
CAILabs (France)
Author
CAILabs (France)
Author
Kerim Yildirim
KU Leuven (Belgium)
Author
CAILabs (France)
Author
CAILabs (France)
Author
Balasubramanian Nagarajan
KU Leuven (Belgium)
Author
Sylvie Castagne
KU Leuven (Belgium)
Author
Pu Jian
CAILabs (France)
Author
CAILabs (France)
Presenter/Author
Adeline Orieux
CAILabs (France)