Paper 13354-33
Paper 13354-33
High throughput two-photon-lithography system powered by metalens array (Invited Paper)
30 January 2025 • 9:00 AM - 9:25 AM PST | Moscone South, Room 201 (Level 2)
Abstract
Two-photon-lithography (TPL) is a powerful nano-3D printing technique known for leveraging non-linear absorption to enable sub-micron printing resolution. However, the throughput of TPL is limited owing to its single laser spot scanning mechanism and the limited field-of-view of conventional microscope objectives. We present a novel parallelized TPL platform that replaces the single high-NA objective with a large array of high-NA, polymer immersion metalenses. Independent control over the focusing intensity from each metalens is achieved using a spatial light modulator (SLM) to modulate the intensity of each metalens focusing spot, enabling the large scale writing of periodic and aperiodic patterns with time scales and stitching errors that exceed the capabilities of conventional platforms.
Presenter
Chenkai Mao
Stanford Univ. (United States)
Chenkai is a 5th year eletrical engineering PhD student at Stanford University advised by Prof. Jonathan Fan. His research involves using novel deep learning methods to build efficienct surrogate solvers and inverse design optimizers, as well as simulate, design and fabricate nanophotonic devices for applications including nano 3D printing.