Attend this year's workshop on Large EUV Mask Format where we encourage representatives from companies and institutions of suppliers, users, and stakeholders to provide quick updates on recent progress and/or future plans. We will address high-NA EUV productivity improvement, give a key requirement summary on the “6x12” large reticle by ASML, provide a device manufacturers’ update, and discuss SEMI Standards, blank manufacturing processes, infrastructure on reticle pod, load port, etc., and all mask process tools. This workshop will again be hosted by Frank Abboud of Intel.