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    Past Event Overview

    Scanning Microscopies 2015

    SPIE Scanning Microscopies, a multidisciplinary conference for advancing scanning microscopy technologies and applications. This event brings microscopists from all phase of scanning microscopies (from scanned optics to scanned particle beams) together in a single forum to discuss current research and new advancements in the field.

    Review the 2015 Program
     • News and photos
     • Final Technical Program (3 MB PDF)
     • Technical Abstracts (1 MB PDF)
    2015 Keynote Presentation
    Harry J. Levinson

    Lithography and Mask Challenges at the Leading Edge

    Harry J. Levinson 
    Sr. Director Technology Research

    2015 Topics
     • Optical, Particle Beam (ion and electron), and Scanned Probe
     • Forensics
     • Biological and Pharmaceutical
     • Food Analysis: Microstructure, Identification, and Counterterrorism
     • Environment, Health, and Safety
     • Nanofabrication and Nanolithography
     • Photomask Imaging, Metrology, and Characterization
     • Nanomaterials
     • Instrument Calibration, Evaluation, and Standards
     • Industrial Semiconductor Applications
    Co-located with SPIE Photomask Technology 2015
    SPIE Scanning Microscopies is co-located with SPIE Photomask Technology 2015, the premier worldwide technical meeting for the photomask industry. Two conferences for one registration, plus access to multidisciplinary connections and information.
    SPIE Photomask Technology
    Monterey Conference Center and Monterey Marriott
    Monterey, California, United States
    29 September - 1 October 2015