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    Past Event Overview

    The Annual SPIE/BACUS Symposium is the premier worldwide technical conference and exhibition for the photomask industry. This year's four-day symposium will give you the chance hear the latest research on the emerging and on-going issues facing the photomask industry in advanced lithography and their manufacturing and data solutions. With the deep sub-wavelength era upon us, the industry's progress will depend on the successful integration and optimization of design, maskmaking, and wafer fabrication.

    • 1,100 Attendees
    • 46 Exhibitors
    • 200 Technical Papers

    Highlights from Photomask 2008: