Past Event Overview
SPIE would like to thank everyone involved with SPIE Lithography Asia—Taiwan 2008. Thank you for your support and participation!
SPIE Lithography Asia 2008 featured presentations from leading researchers, developers, and innovators. The latest research on semiconductor device technologies was presented. • Final Conference Program (PDF)
Information on Lithography Asia 2009 will be available in early 2009.Conference chairs:
Alek C. Chen ASML Taiwan Ltd.Conference Chair Burn Lin Taiwan Semiconductor Manufacturing Co. Ltd.Conference Cochair Anthony Yen Taiwan Semiconductor Manufacturing Co. Ltd.Conference Cochair
Conference topics included:
Emerging Lithographic Technology and Nanofabrication
Optical lithography extension (shorter than 157 nm) EUV lithography E- and ion- beam technology Nano-imprint lithography Application on nanostructures
Optical Microlithography
ArF immersion lithography RET technology Double exposure/double patterning lithography OPC modeling Photo cluster automation
Advances in Resist Material and Processing
Emerging resist materials Advancement in immersion resists Resist process optimizations Resist material for LCD application Double exposure material
Metrology, Inspection, and Process Control
Advancement in CD metrology Advancement in overlay metrology Advancement in defect inspection Process control for CD and overlay Emerging metrology technology
LCD Application
Imaging technology Process control Material technology Automation and productivity