SPIE Advanced Lithography, 23 - 27 February 2014, the premier conference for the lithography community. For 38 years, SPIE has brought together this community to address challenges presented in fabricating next-generation integrated circuits.
See what happened: onsite news and photos
Technical Program (PDF 6 MB)
Technical Abstracts (PDF 2 MB)
Exhibition Guide (PDF 4 MB)
My Year as SPIE President: What Does the Society Do and Who Makes It Happen?
William H. ArnoldChief Scientist and VP of Technology Development Center, ASML2013 SPIE President
Making the Impossible: Dealing with Patterns Throughout the Design and Manufacturing Flow
Joseph SawickiVP and GM, Design-to-Silicon Division,Mentor Graphics Corp.
Beyond Scaling: Opportunities and Approaches
Akihisa SekiguchiCorporate VP and Deputy General Manager, Tokyo Electron Ltd.
