SPIE Advanced Lithography + Patterning plenary events

Hear from leading experts from the semiconductor industry

Leading experts share visions for the future

Advanced Lithography + Patterning plenary sessions feature presentations on the challenges in optical and EUV lithography, patterning technologies, metrology, and process integration for semiconductor manufacturing and adjacent applications.

Speaker delivering plenary talk at SPIE Advanced Lithography
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26 February 2024 • 8:00 AM - 9:10 AM PST | Convention Center, Ballroom 220A 
Join us for the symposium welcome, introduction of new SPIE Fellows, the presentation of the SPIE Zernike Award and Nick Cobb Memorial Scholarship, and a plenary presentation by Todd Younkin of Semiconductor Research Corp. on SRC's MAPT roadmap.
27 February 2024 • 8:00 AM - 9:20 AM PST | Convention Center, Ballroom 220A 
Please join us to hear plenary talks by Ann Kelleher, EVP and GM Technology Development, Intel, USA and Chan Hwang, VP and Master, Lithography, Samsung, Korea.