8:55 AM - 9:15 AM:
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Enhancing AR/VR experiences: advanced sensing, display, and manufacturing solutions
This presentation highlights our innovative AR/VR components designed for enhanced immersion and interaction. We cover laser illumination technologies for precise 3D sensing and user tracking, as well as high-index materials for highly immersive displays. Additionally, we discuss laser-based manufacturing tools for efficient uLED display manufacturing and holographic element (HOE) production. Together, these advancements support scalable, high-quality AR/VR solutions that will drive more engaging and responsive user experiences.
9:15 AM - 9:25 AM:
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Breaking barriers in microLED technology: perovskite-based colour conversion
MicroLEDs hold the key to the brightness AR microdisplays demand, but achieving vibrant RGB colours remains a significant technical challenge. Enter perovskite nanocrystals—a game-changing alternative to quantum dots. Beyond their high conversion efficiency and superior blue light absorption, perovskites are chemically defined, avoiding the inconsistencies tied to nanocrystal size variations in QDs, and are more easily manufactured at convenient temperatures.
In this presentation, Helio showcases its cutting-edge perovskite-based colour conversion materials, offering unmatched stability under high blue light flux and sub-10 µm pixel precision. Discover why perovskites are not just an improvement, they’re a leap forward in display technology. Will this innovation reshape the future of AR microdisplays?
9:25 AM - 9:35 AM:
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Applications of lithography in nano/micro-photonics
As the micro-nano photonic devices are widely used in many areas of consumer electronics, intelligent security, automobile, etc., the volume production of micro-nano-photonic elements, such as diffractive optical waveguides, diffractive optical elements (DOEs), meta-lens, etc. becomes more and more important. The lithography therefore is one of the most powerful methods to utilize in these areas. This presentation will mainly introduce the industry research and progress of the applications of lithography in micro-nano photonics, especially in AR/VR/MR. It will focus on how to achieve high volume production with reasonable cost.
9:35 AM - 9:45 AM:
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Application of wafer-level nano-optics in lightweight AR glasses
In this industrial presentation, we will focus on the pain points of the product requirements for lightweight augmented reality (AR) glasses and elaborate on the progress made by Sunny OmniLight in the field of wafer-level Nano-Optics. It will include the improvement of rainbow stripes on diffractive waveguides, the progress of the ball-drop test, and the eyepiece module (EPM) solution for addressing myopia and dimming issues. Meanwhile, we will introduce the research progress of meta-optics as well as their application scenarios.
9:45 AM - 9:55 AM:
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Direct nanoimprint as a platform technology for all-inorganic waveguides
We demonstrate the use of nanoimprint lithography using nanoparticle-based inks as a platform technology for low loss, all-inorganic waveguides with refractive indices ranging from 1.7 to 2.3. The all-inorganic character provides superior optical and material stability while low viscosities of the imprint formulations enable significant reductions in imprint time on full-wafer tools relative to polymer/nanoparticle composites. The material sets can be tuned for superior transmission in the blue at RIs of 2.0 and below, relative to TiO2 based materials, while low temperature processing enables compatibility with high index wafers. A few cycles of atomic layer deposition can be used to precisely tune the refractive index of the imprints. Index matching of the imprints to the wafers minimizes effects from the residual layer. Dimensions of the nanostructures can be tuned by conformal cladding.
9:55 AM - 10:10 AM:
Coffee Break
10:10 AM - 10:20 AM:
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Scatterometry with nanometer sensitivity for non-destructive quality inspection of gratings and thin films
Maintaining structural uniformity in nano-gratings is essential for high production yields, as minor deviations can degrade device performance. Traditional inspection methods like scanning electron microscopy and atomic force microscopy offer precise nanoscale measurements but are hindered by low throughput and the need to destroy samples for cross-sectional analysis, making them unsuitable for large-scale production. To overcome these limitations, an innovative scatterometry technique using Fourier microscopy is introduced. This non-destructive, high-throughput method achieves single-nanometer precision in critical dimension (CD) metrology by illuminating the sample with a controlled incidence angle via a back-focal plane-focused light beam. By analyzing the diffracted light orders at various angles, the technique accurately extracts optical performance and geometrical characteristics of gratings or films, such as line width, height, spacing, and residual layer thickness. Demonstrated through dense scanning of grating patches, this method enables rapid mapping of structural uniformity across wafers, enhancing production yields by identifying fabrication defects.
10:20 AM - 10:30 AM:
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Bringing AR to volume manufacturing with optical lithography
Manufacturing AR waveguides with diffractive structures requires a high-volume, low-cost lithography solution that can print the necessary patterns with high accuracy and fidelity. Displacement Talbot Lithography (DTL) has emerged as one of the main contenders for this challenging task. DTL enables reproducible patterning of highly precise and defect-free gratings with large, seamless exposure fields and with the required resolution and quality. As an optical lithography technology, DTL relies on industry standard exposure concepts, materials, and resources such as photoresists, lasers, and photomasks. Adoption of this lithography technology to specific needs of the AR waveguide application and examples from its real-life implementation will be presented.
10:30 AM - 10:40 AM:
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Enhancing waveguide output uniformity by advanced patterning techniques
Diffractive waveguide combiners for Augmented Reality (AR) require a difficult balance between the efficient outcoupling of the light and the uniformity of the display. Here we leverage the well-developed techniques of CMOS fabrication to demonstrate fine control over the critical dimension of out-coupler gratings, providing a powerful tool to optimize display performance.
10:40 AM - 10:50 AM:
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Advanced 3D patterning enabling future optical designs
Nanoimprinting technology is being adopted as the lithography process of choice for AR/VR/MR, as well as for many other applications. This is a cost-effective solution offering optimum pattern fidelity, especially for non-Manhattan/Curvilinear structures.
The pattern must be created as a 3D profile on a master, which is then used to stamp copies of them onto various substrates.
This is achieved by using the most advanced Ebeam Lithography (EBL) fleet of equipment, including Multi Beam Mask Writers (MBMW), combined with state-of-the-art etching processing techniques to meet the special requirements for gratings, and metalens applications among others.
By the combination of Multi level ebeam exposure and advanced etching techniques, we can demonstrate the range of options available to optical designers for the realization of ARVR, and other devices.
The manufacturing capabilities described are a substantial enabler of the technologies required for AR/VR/MR devices, Metalenses and other applications.
10:50 AM - 2:35 PM
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| Thomas Viart Product Marketing Engineer, Imaging Sensors, Americas Region STMicroelectronics |
Matteo Fusi Product Marketing Director, MEMS and Sensors, Americas Region STMicroelectronics |
Sensing the Future: Human-Centric, Sustainable Innovations in AR/VR/MR
Sensors are at the core of many of our interactions with the world, serving as the bridge between the physical and digital realms. In the dynamic landscape of AR/VR/MR, sensors play a pivotal role in enabling a natural and human centric experience. This session will delve into the transformative impact of advanced sensor technologies: our experts will discuss the latest innovation on motion MEMS including embedded sensor fusion and contextual awareness, biopotential sensors, multizone Time-of-Flight ranging sensors, and Global Shutter image sensors as well as ALS with flicker detector sensor.
Event Details
FORMAT: General session with live audience Q&A to follow some presentations.MENU: Coffee, decaf, and tea will be available outside the presentation room in the nearby exhibition.
SETUP: Mix of theater and classroom style seating.